Date Announced: 02 Jun 2010 AIXTRON AG today announced a new order for two CRIUS® 31x2-inch configuration deposition systems from Yangzhou Zhongke Semiconductor Lighting Center Co. Ltd. The company placed the order in the fourth quarter of 2009 and after delivery in the second quarter of 2010 they will be used for GaN high brightness LED production for streetlight and display backlighting applications. The local AIXTRON support team will commission the new reactors at the facility within the company’s research group,ISCAS, in China.General Manager Dr. Wang GuoHong, comments, “Our reason for purchase was an outstanding need for capacity increase. Up to now our research group, ISCAS, has been using our first AIXTRON system and they are very satisfied with the system's all round performance. Now, however, we need a new capability that gives us high throughput but with lower cost and easy operation. We are convinced that we will get all these features and more from the world-class CRIUS® MOCVD reactors supplied by AIXTRON. Backed up by their excellent service and support they will give us the complete package.”For further information on AIXTRON AG (FSE: AIXA, ISIN DE000A0WMPJ6; NASDAQ: AIXG, ISIN US0096061041) please consult our website at: www.aixtron.com.Forward-Looking StatementsThis news release may contain forward-looking statements about the business, financial condition, results of operations and earnings outlook of AIXTRON within the meaning of the “safe harbor” provisions of the United States Private Securities Litigation Reform Act of 1995. Words such as “may”, “will”, “expect”, “anticipate”, “contemplate”, “intend”, “plan”, “believe”, “continue” and “estimate”, and variations of these words and similar expressions, identify these forward-looking statements. The forward-looking statements reflect our current views and assumptions and are subject to risks and uncertainties. You should not place undue reliance on the forward-looking statements. The following factors, and others which are discussed in AIXTRON’s public filings and submissions with the U.S. Securities and Exchange Commission, are among those that may cause actual and future results and trends to differ materially from our forward-looking statements: actual customer orders received by AIXTRON; the extent to which chemical vapor deposition, or CVD, technology is demanded by the market place; the timing of final acceptance of products by customers; the financial climate and accessibility of financing; general conditions in the thin film equipment market and in the macro-economy; cancellations, rescheduling or delays in product shipments; manufacturing capacity constraints; lengthy sales and qualification cycles; difficulties in the production process; changes in semiconductor industry growth; increased competition; exchange rate fluctuations; availability of government funding; variability and availability of interest rates; delays in developing and commercializing new products; general economic conditions being less favorable than expected; and other factors. The forward-looking statements contained in this news release are made as of the date hereof and AIXTRON does not assume any obligation to update or revise any forward-looking statements, whether as a result of new information, future events or otherwise, unless required by law.
Contact
For further information please contact Marketing Communications Octavia Deufel AIXTRON AG Kaiserstr. 98 52134 Herzogenrath Germany Phone: +49 241 8909 474 Fax: +49 241 8909 522 www.aixtron.com
E-mail:[email protected]
Web Site:www.aixtron.com
