Brewer Science unveils ARC 300 variable optical property BARC series

Feb 25th, 2011
Date Announced: 25 Feb 2011

Brewer Science, the leading supplier of advanced lithography materials, is pleased to launch the ARC® 300 coating series, a state-of-the-art ArF bottom anti-reflective coating (BARC) series that provides broad photoresist compatibility and variable optical properties. The ARC® 300 coating series is designed to be optimized using Brewer Science’s proprietary OptiStack® lithography simulation software in order to fit the needs of a variety of advanced ArF lithography processes and substrates with a single BARC platform.

In addition to the widely recognized and proven broad resist compatibility of Brewer Science’s ARC® line of products, the unique ARC® 300 coating series also allows for a range of n and k values in a single BARC platform. This advanced new material provides low reflectivities of less than 0.1% for a variety of substrates and film thicknesses. The ARC® 300 coating series is ideal for extending leading-edge ArF dry and immersion processes in both single- and double-patterning lithography schemes.

“ARC® 300 coating series gives lithographers the ability to use a single BARC platform across many different photoresists and substrates,” says Chris Cox, Semiconductor Technology Director for Brewer Science. “This greatly reduces process development time by eliminating the need to pair different BARCs with different substrates. Customers will be able to spend less time searching for a BARC with the correct optical properties and resist compatibility and simply choose the ARC® 300 coating series as a universal BARC solution. The variable n and k values coupled with our OptiStack® simulation software allow for fine-tuning of photoresist profiles and performance. No other product on the market comes close to allowing this level of optical property control.”

Brewer Science continuously improves leading-edge lithography products to reduce defectivity and outgassing and increase ease of line integration. For more information about the ARC® 300 coating series and OptiStack® lithography simulation software, please contact Chris Cox, Technology Director, at rcox@brewerscience.com.

About Brewer Science
For 30 years, Brewer Science has consistently developed and delivered innovative materials, processes, and equipment for applications in semiconductors, advanced packaging/3-D ICs, MEMS, displays, LEDs, and printed electronics. Our products include ARC® anti-reflective coatings, ProTEK® protective coatings, WaferBOND® temporary bonding coatings, the ZoneBOND™ thin wafer processing system, OptiNDEX™ high refractive index materials, OptiStack® multilayer lithography systems, CNTRENE® carbon nanotube solutions, and Cee® laboratory-scale wafer processing equipment. We invite you to learn more about Brewer Science at www.brewerscience.com.

Contact
Chris Cox Technology Director, Semiconductor Business Unit Brewer Science, Inc. tel: +1 573-364-0300 email: rcox@brewerscience.com.

E-mail:rcox@brewerscience.com

Web Site:www.brewerscience.com

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