Corial D350, the production-ready PECVD system for fast and uniform deposition on full 300 mm wafers, or large batch capacity.

The Corial D350 PECVD system is designed to produce high-quality, uniform films optoelectronics market. The Corial D350 system is based on our unique reactor design. It houses an isothermal, pressurized reactor within a vacuum vessel, which is different from conventional PECVD reactors with heated substrate holders. The Corial D350 PECVD system handles full 300 mm wafers or large batch capacity (27 x 2”), enabling volume production of high-quality films. Typical applications for this PECVD system include passivation deposition for optoelectronics. The Corial D350 system can operate for years without the need for manual cleaning.
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