Rubicon Technology receives patent for in-situ crystal orientation

Date Announced: 01 Aug 2012

Rubicon's new patented orientation technology provides greater precision in sapphire planar orientation and eliminates time-consuming steps by performing the orientation at the fabrication tool.

Rubicon Technology, Inc. (NASDAQ:RBCN), a leading provider of sapphire substrates and products to the LED, semiconductor, and optical industries, today announced that the United States Patent and Trademark Office (USPTO) has allowed Rubicon’s patent application entitled, “Intelligent Machines and Process for Production of Monocrystalline Products with Goniometer Continual Feedback.” The patent covers Rubicon’s equipment and process developed to perform in-situ orientation of its sapphire crystals within the various fabrication tools used by the Company.

Rubicon’s customers in the LED, SoS/RFIC and optical markets all have specific and distinct requirements for the crystal planar orientation of the sapphire products used in their applications. The new patented orientation technology provides greater precision in sapphire planar orientation and eliminates time-consuming steps by performing the orientation at the fabrication tool. These resulting efficiencies will ultimately translate into savings for Rubicon customers.

“Rubicon is known by many for its expertise in crystal growth technology, but our technological leadership extends from raw material through finished sapphire wafers,” said Raja M. Parvez, President and CEO of Rubicon Technology. “This patent reflects one of many technological innovations we’ve put in place to meet our customers’ exacting and evolving requirements.”

For more information about Rubicon Technology visit www.rubicon-es2.com.

Contact
Robin Kelman 215-867-8600

E-mail:rkelman@garfieldgroup.com

Web Site:www.rubicon-es2.com

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