Obducat is the world’s leading developer and supplier of Micro- and Nano- lithographic systems. Our technologies include Nanoimprint lithography (NIL) and Electron Beam Lithography.

Our NIL tools are used in a variety of applications including: semiconductors, photonic devices, sensors, MEMS/NEMS and Bio-Medical devices. Our innovative Soft Press technology delivers unequalled critical dimension control.

Obducat's E-Beam Systems employ a unique radial stage well suited to information storage applications as well as prism pattering.

Obducat also supplies NIL Stampers (Templates / Masks).